Exploiting atomic layer deposition for fabricating sub-10 nm X-ray lenses (1809.07251v1)

Abstract: Moving towards significantly smaller nanostructures, direct structuring techniques such as electron beam lithography approach fundamental limitations in feature size and aspect ratios. Application of nanostructures like diffractive X-ray lenses requires feature sizes of below 10 nm to enter a new regime in high resolution X-raymicroscopy. As such dimensions are difficult to obtain using conventional electron beam lithography, we pursue a line-doubling approach. We demonstrate that thismethod yields structure sizes as small as 6.4 nm. X-ray lenses fabricated in this way are tested for their efficiency and microscopic resolution. In addition, the line-doubling technique is successfully extended to a six-fold scheme, where each line in a template structure written by electron beam lithography evolves into six metal lines.