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Granular Aluminium (grAl) Superconductors

Updated 7 July 2026
  • Granular aluminium (grAl) is a superconducting material composed of nanocrystalline Al grains separated by thin oxide barriers, allowing tunable intergrain coupling and resistivity.
  • It exhibits high kinetic inductance and acts as an effective Josephson-junction network, making it ideal for quantum circuits such as qubits, resonators, and parametric amplifiers.
  • Its unique microstructure enables exploration of metal–insulator transitions, charging effects, and glassy nonequilibrium dynamics, underlining its significance in superconducting research.

Granular aluminium (grAl) is a superconducting aluminium film in which nanocrystalline or nano-scale Al grains are separated by thin aluminum-oxide barriers or embedded in an amorphous AlOx\mathrm{AlO_x} matrix. Across a broad resistivity range, it is described as a granular superconductor, an effective Josephson-junction network, a high-kinetic-inductance material, and, in transport work near the metal–insulator transition, a correlated granular electron system. These properties underlie its use in high-impedance resonators, superinductors, qubits, parametric amplifiers, kinetic inductance detectors, and semiconductor–superconductor hybrids, while also linking it to localized spins, charging effects, in-gap states, and glassy nonequilibrium transport (Moshe et al., 2020, Bachar et al., 2014, Ramos et al., 5 Aug 2025).

1. Material definition and microstructure

Granular aluminium is produced by depositing Al in oxygen so that the film does not remain a uniform clean metal. In the formulation used across the literature, it consists of crystalline Al grains separated by thin aluminum-oxide barriers, or of nanometer-scale aluminum grains embedded in an amorphous oxide matrix (Moshe et al., 2020). Oxygen partial pressure and deposition rate tune the intergrain coupling and thus the normal-state resistivity; in sputtered films, the oxygen flow together with deposition rate sets the film resistivity and therefore the superconducting disorder, and measured sheet resistance is more reliable than nominal oxygen percentage because reproducibility versus nominal oxygen percentage is imperfect (Ramos et al., 5 Aug 2025).

The microstructure depends on growth conditions. Room-temperature growth gives typical grain size 3nm\sim 3\,\mathrm{nm}, whereas lower-temperature growth around 100K100\,\mathrm{K} yields smaller grains, 2nm\sim 2\,\mathrm{nm}, with a narrower size distribution (Moshe et al., 2020). In sputtered coplanar-resonator films, transmission electron microscopy indicates grain sizes ranging from about 3nm3\,\mathrm{nm} to tens of nm, with average size (6±1)nm(6\pm1)\,\mathrm{nm}, a columnar morphology along the growth direction, and smooth surfaces with rms roughness about (1.2±0.3)nm(1.2\pm0.3)\,\mathrm{nm}, comparable to pure Al; film thicknesses are around 60 ⁣ ⁣73nm60\!-\!73\,\mathrm{nm} (Ramos et al., 5 Aug 2025).

This granular structure is central rather than incidental. Several device papers treat grAl as a three-dimensional network of effective Josephson junctions, and elongated strips are often modeled as effective one-dimensional junction arrays (Maleeva et al., 2018). A plausible implication is that grAl occupies an intermediate position between homogeneous dirty superconductors and lithographically defined Josephson-junction arrays: its disorder is structural and intergranular rather than purely atomic.

2. Disorder tuning, superconducting dome, and correlated-electron regimes

A defining feature of grAl is the tunability of its resistivity over a very wide range, from about $10$ to 105μΩcm10^5\,\mu\Omega\,\mathrm{cm} by changing oxygen pressure during deposition (Yang et al., 2019). As resistivity increases, the critical temperature first rises above that of pure Al and then decreases. For room-temperature growth, the maximum 3nm\sim 3\,\mathrm{nm}0 is reported as 3nm\sim 3\,\mathrm{nm}1; for lower-temperature growth around 3nm\sim 3\,\mathrm{nm}2, the maximum is 3nm\sim 3\,\mathrm{nm}3–3nm\sim 3\,\mathrm{nm}4 (Moshe et al., 2020). Transport work also reports a 3nm\sim 3\,\mathrm{nm}5 peak around 3nm\sim 3\,\mathrm{nm}6 for liquid-nitrogen-temperature deposition and 3nm\sim 3\,\mathrm{nm}7 for room-temperature deposition in the resistivity range 3nm\sim 3\,\mathrm{nm}8–3nm\sim 3\,\mathrm{nm}9 (Bachar et al., 2014).

Two distinct resistivity scales recur in the literature. In STM studies, the “Mott resistivity” is 100K100\,\mathrm{K}0, near the peak of the superconducting dome; above 100K100\,\mathrm{K}1, local charging effects, in-gap states, and additional low-energy excitations appear on individual grains, while similar films become insulating only later, around 100K100\,\mathrm{K}2 (Yang et al., 2019). By contrast, transport and 100K100\,\mathrm{K}3SR work identify the metal–insulator transition near 100K100\,\mathrm{K}4, where the low-temperature resistivity changes from logarithmic to exponential temperature dependence (Bachar et al., 2014). Taken together, these papers distinguish an earlier microscopic crossover toward decoupling from the later macroscopic metal–insulator transition.

The transport/100K100\,\mathrm{K}5SR interpretation emphasizes correlations. Free spins are directly observed, with an inferred concentration of about 100K100\,\mathrm{K}6, and the negative magneto-resistance grows by several orders of magnitude with increasing resistivity, following 100K100\,\mathrm{K}7 (Bachar et al., 2014). Combining this with Hall-effect scaling yields 100K100\,\mathrm{K}8 and an effective Fermi energy 100K100\,\mathrm{K}9; the central claim is that the metal–insulator transition occurs when 2nm\sim 2\,\mathrm{nm}0 becomes comparable to the grain charging energy 2nm\sim 2\,\mathrm{nm}1, so that the transition is best understood as a granular Mott transition rather than a purely Anderson-localization problem (Bachar et al., 2014). A related comparative argument states that grAl approaches a correlation-driven, Mott-like transition, whereas atomically disordered materials such as 2nm\sim 2\,\mathrm{nm}2 approach a disorder-driven Anderson transition with more abundant sub-gap states (Moshe et al., 2020).

3. Superconducting electrodynamics and kinetic inductance

The superconducting utility of grAl derives from its large kinetic inductance. In the dirty limit,

2nm\sim 2\,\mathrm{nm}3

and, using the practical dirty-limit relation,

2nm\sim 2\,\mathrm{nm}4

with the weak-coupling BCS relation 2nm\sim 2\,\mathrm{nm}5 (Moshe et al., 2020). A related low-temperature form used for sputtered aluminium-oxide wires is

2nm\sim 2\,\mathrm{nm}6

This resistance-based scaling makes room-temperature sheet resistance a practical design knob for microwave inductance (Rotzinger et al., 2014).

At the materials level, grAl can maintain a sharp superconducting transition at very high resistivity. One synthesis paper reports normal-state resistivity of order 2nm\sim 2\,\mathrm{nm}7 and expected kinetic inductance of order 2nm\sim 2\,\mathrm{nm}8, with superconductivity still present even when 2nm\sim 2\,\mathrm{nm}9 exceeds 3nm3\,\mathrm{nm}0 (Moshe et al., 2020). The same comparison argues that at approximately the same 3nm3\,\mathrm{nm}1, grAl resonators exhibit 3nm3\,\mathrm{nm}2, whereas 3nm3\,\mathrm{nm}3 resonators give only 3nm3\,\mathrm{nm}4 (Moshe et al., 2020).

Microwave extraction shows that the resistance formula is not always numerically sufficient for actual coplanar structures. In quarter-wave coplanar resonators fabricated from 3nm3\,\mathrm{nm}5 films with 3nm3\,\mathrm{nm}6 from 3nm3\,\mathrm{nm}7 to 3nm3\,\mathrm{nm}8, Mattis–Bardeen fits to temperature-dependent resonance shifts yield average kinetic-inductance fractions

3nm3\,\mathrm{nm}9

with extracted effective sheet inductances up to (6±1)nm(6\pm1)\,\mathrm{nm}0 and total resonator kinetic inductance up to (6±1)nm(6\pm1)\,\mathrm{nm}1 for a (6±1)nm(6\pm1)\,\mathrm{nm}2 quarter-wave device (Ramos et al., 5 Aug 2025). That work explicitly notes an unresolved discrepancy between microwave-extracted (6±1)nm(6\pm1)\,\mathrm{nm}3 and simple BCS resistance-based estimates, and therefore emphasizes direct microwave metrology rather than inference from nominal growth parameters alone (Ramos et al., 5 Aug 2025).

4. Microwave circuits, nonlinear elements, and hybrid platforms

grAl has become a circuit material because it combines large inductance, useful nonlinearity, and fabrication compatibility with Al-based processing. In resonator experiments spanning low GHz frequencies up to the spectral gap, measured self-Kerr coefficients range from (6±1)nm(6\pm1)\,\mathrm{nm}4 to (6±1)nm(6\pm1)\,\mathrm{nm}5, within an order of magnitude from analytic calculations based on grAl microstructure, while (6±1)nm(6\pm1)\,\mathrm{nm}6 remains in the (6±1)nm(6\pm1)\,\mathrm{nm}7 range (Maleeva et al., 2018). This distributed Josephson-medium description is central to its role in high-impedance circuit quantum electrodynamics.

As a superinductor material, grAl has been implemented in fluxonium. One design uses a (6±1)nm(6\pm1)\,\mathrm{nm}8 long grAl superinductor strip with estimated characteristic impedance (6±1)nm(6\pm1)\,\mathrm{nm}9, first self-resonant mode at (1.2±0.3)nm(1.2\pm0.3)\,\mathrm{nm}0, total loop inductance (1.2±0.3)nm(1.2\pm0.3)\,\mathrm{nm}1, and Ramsey coherence (1.2±0.3)nm(1.2\pm0.3)\,\mathrm{nm}2 up to (1.2±0.3)nm(1.2\pm0.3)\,\mathrm{nm}3 (Grünhaupt et al., 2018). A separate fluxonium variant replaces the conventional mesoscopic Al/AlO(1.2±0.3)nm(1.2\pm0.3)\,\mathrm{nm}4/Al junction with a lithographically defined grAl nano-junction; the resulting “gralmonium” has (1.2±0.3)nm(1.2\pm0.3)\,\mathrm{nm}5, (1.2±0.3)nm(1.2\pm0.3)\,\mathrm{nm}6, (1.2±0.3)nm(1.2\pm0.3)\,\mathrm{nm}7, average (1.2±0.3)nm(1.2\pm0.3)\,\mathrm{nm}8, and Hahn echo (1.2±0.3)nm(1.2\pm0.3)\,\mathrm{nm}9, while also showing spontaneous jumps of 60 ⁣ ⁣73nm60\!-\!73\,\mathrm{nm}0 on timescales from milliseconds to days (Rieger et al., 2022).

grAl can also supply the nonlinear element of a transmon-like qubit. A 60 ⁣ ⁣73nm60\!-\!73\,\mathrm{nm}1 grAl volume shunted by a thin-film aluminum capacitor yields an anharmonicity 60 ⁣ ⁣73nm60\!-\!73\,\mathrm{nm}2, intrinsic linewidth 60 ⁣ ⁣73nm60\!-\!73\,\mathrm{nm}3, and an intrinsic lifetime of 60 ⁣ ⁣73nm60\!-\!73\,\mathrm{nm}4 (Winkel et al., 2019). This establishes that the intrinsic grAl nonlinearity is sufficient for qubit operation.

For passive elements, low-loss lumped inductors made from grAl reach a few nH of inductance in footprints up to 60 ⁣ ⁣73nm60\!-\!73\,\mathrm{nm}5 times more compact than pure Al, with all-grAl devices reaching 60 ⁣ ⁣73nm60\!-\!73\,\mathrm{nm}6 and hybrid grAl/Ta devices reaching 60 ⁣ ⁣73nm60\!-\!73\,\mathrm{nm}7 (Gupta et al., 2024). For active microwave electronics, a non-degenerate grAl parametric amplifier built from two coupled grAl resonators is resilient to in-plane magnetic field up to 60 ⁣ ⁣73nm60\!-\!73\,\mathrm{nm}8, with 60 ⁣ ⁣73nm60\!-\!73\,\mathrm{nm}9 gain, a gain-bandwidth product of $10$0, and $10$1 input saturation power (Zapata et al., 2024).

The hybrid-device role of grAl extends beyond all-superconducting circuits. Deposited on Ge/SiGe heterostructures, grAl induces a hard superconducting gap with BCS peaks at $10$2, remains resilient for both in-plane and out-of-plane magnetic fields, and allows Zeeman splitting of Yu–Shiba–Rusinov states beyond $10$3 ($10$4), together with $10$5-tensor tunability (Fabris et al., 24 Feb 2026). This suggests that grAl is useful not only as a high-impedance circuit material but also as a parent superconductor for spin-based hybrid devices.

5. Microwave loss, quasiparticles, TLS, and magnetic-field response

Microwave loss in grAl is not governed by a single mechanism across all regimes. In coplanar resonators made from sputtered films with modest sheet resistance, the low-temperature internal quality factor increases with microwave power in a way consistent with TLS saturation. Fits give an average TLS contribution $10$6, $10$7 close to $10$8, TLS saturation power below one photon, and a non-TLS loss floor corresponding to quality factor limited to roughly $10$9 (Ramos et al., 5 Aug 2025). That work does not find a clear systematic trend of TLS loss with kinetic inductance fraction or oxidation level, although it stresses that TLS are intrinsic to the growth process because oxygen is incorporated during deposition (Ramos et al., 5 Aug 2025).

At lower resistivity, grAl can reach much higher 105μΩcm10^5\,\mu\Omega\,\mathrm{cm}0, but a compactness–coherence trade-off emerges. In lumped-element inductors with sheet inductances from 105μΩcm10^5\,\mu\Omega\,\mathrm{cm}1 to 105μΩcm10^5\,\mu\Omega\,\mathrm{cm}2, the measured internal quality factors systematically decrease with increasing room-temperature resistivity for all devices, while the lowest-resistivity films reach 105μΩcm10^5\,\mu\Omega\,\mathrm{cm}3 for all-grAl devices and 105μΩcm10^5\,\mu\Omega\,\mathrm{cm}4 for hybrid grAl/Ta devices (Gupta et al., 2024). The loss analysis in that work suggests that the surface loss factor of low-resistivity grAl is similar to that of pure Al, whereas the increasing losses with resistivity could be explained by increasing conductor loss in the grAl film (Gupta et al., 2024).

Close to the superconductor–insulator transition, non-equilibrium quasiparticles become the dominant microwave-loss mechanism. Resonators fabricated from grAl with room-temperature resistivity 105μΩcm10^5\,\mu\Omega\,\mathrm{cm}5, sheet resistance 105μΩcm10^5\,\mu\Omega\,\mathrm{cm}6, thickness 105μΩcm10^5\,\mu\Omega\,\mathrm{cm}7, and kinetic inductance fraction close to unity show 105μΩcm10^5\,\mu\Omega\,\mathrm{cm}8 on the order of 105μΩcm10^5\,\mu\Omega\,\mathrm{cm}9 in the single-photon regime, with excess quasiparticle density 3nm\sim 3\,\mathrm{nm}00, quasiparticle bursts every 3nm\sim 3\,\mathrm{nm}01, and relaxation times in the range of 3nm\sim 3\,\mathrm{nm}02 (Grünhaupt et al., 2018). These relaxation times are several orders of magnitude longer than in aluminum films or Josephson-junction superinductances.

Magnetic-field response is strongly anisotropic but can be unusually robust for in-plane fields. grAl resonators with kinetic sheet inductance 3nm\sim 3\,\mathrm{nm}03 retain single-photon 3nm\sim 3\,\mathrm{nm}04 in in-plane magnetic fields up to 3nm\sim 3\,\mathrm{nm}05, with measurements extending to 3nm\sim 3\,\mathrm{nm}06 (Borisov et al., 2020). Small perpendicular fields around 3nm\sim 3\,\mathrm{nm}07 can enhance 3nm\sim 3\,\mathrm{nm}08 by approximately 3nm\sim 3\,\mathrm{nm}09, possibly because fluxons act as quasiparticle traps, whereas larger perpendicular fields drive the resonator into an irreversible plastic regime dominated by trapped and mobile vortices (Borisov et al., 2020). The same experiments reveal a reproducible ESR-related dip with 3nm\sim 3\,\mathrm{nm}10, consistent with a spin-3nm\sim 3\,\mathrm{nm}11 impurity ensemble, possibly in oxide regions between grains (Borisov et al., 2020).

6. Localized states, spins, charging, and insulating-glass phenomenology

Scanning tunneling spectroscopy shows that grAl is not a uniformly disordered superconductor. Near 3nm\sim 3\,\mathrm{nm}12, individual grains have an enhanced superconducting gap 3nm\sim 3\,\mathrm{nm}13; above 3nm\sim 3\,\mathrm{nm}14, grains still show 3nm\sim 3\,\mathrm{nm}15, but spectroscopy also reveals charging thresholds, Coulomb-blockade-like peaks, in-gap states at 3nm\sim 3\,\mathrm{nm}16 and 3nm\sim 3\,\mathrm{nm}17, and a secondary gap of approximately 3nm\sim 3\,\mathrm{nm}18 with additional low-energy peaks (Yang et al., 2019). The preferred interpretation is that localized spins in the oxide barrier create Yu–Shiba–Rusinov-like in-gap states on nearby superconducting grains when grains are sufficiently decoupled, while the additional peaks may indicate bosonic excitations of the superconducting order parameter, although that assignment remains unresolved (Yang et al., 2019).

Independent 3nm\sim 3\,\mathrm{nm}19SR work directly demonstrates free spins in grAl, with a concentration of about 3nm\sim 3\,\mathrm{nm}20 in a relatively metallic sample and an inferred interface spin density of about 3nm\sim 3\,\mathrm{nm}21 for 3nm\sim 3\,\mathrm{nm}22 grains if the spins are associated with Al/Al3nm\sim 3\,\mathrm{nm}23O3nm\sim 3\,\mathrm{nm}24 interfaces (Bachar et al., 2014). This provides a microscopic basis for spin-flip scattering, magneto-resistance anomalies, and, plausibly, some of the in-gap states and microwave loss channels seen in more resistive films.

On the insulating side, grAl also exhibits electron-glass-like transport. Thin insulating granular Al films show a symmetrical field effect, a conductance dip centered at the equilibration gate voltage, memory, and very slow conductance relaxations; in one representative sample at 3nm\sim 3\,\mathrm{nm}25, 3nm\sim 3\,\mathrm{nm}26 and the dip full width at half maximum corresponds to 3nm\sim 3\,\mathrm{nm}27 (Grenet, 2012). Subsequent work demonstrates aging and 3nm\sim 3\,\mathrm{nm}28 scaling, and then “true aging,” meaning that the anomalous field-effect relaxation depends on the time elapsed since cooling: the longer this time, the longer it takes for the system to react to a gate-voltage change (Delahaye et al., 2012, Delahaye et al., 2012). These observations place grAl among disordered insulators that display slow nonequilibrium electronic dynamics in addition to superconductivity and high-kinetic-inductance behavior.

Taken together, these results portray grAl as a material system in which superconductivity, granularity, charging energy, localized spins, intergrain tunneling, high kinetic inductance, and nonequilibrium glassy dynamics coexist on experimentally relevant scales. This breadth explains both its utility in quantum devices and the persistent need for direct microwave, spectroscopic, and transport characterization in each processing regime.

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