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Few-Layer V2C MXene Research

Updated 9 July 2026
  • Few-layer V2C MXene is a two-dimensional vanadium carbide characterized by mixed surface terminations (-O, -F, -OH) that tune its metallic electronic structure.
  • It is synthesized via HF etching of V2AlC followed by intercalation and ultrasonic delamination, yielding transparent, few-atomic-layer flakes with expanded interlayer spacing.
  • Its broadband plasmonic response and sub-picosecond relaxation dynamics enable strong, wavelength-dependent saturable absorption for applications in ultrafast fiber lasers and energy storage.

Few-layer V2CV_2C MXene is a two-dimensional vanadium carbide derived experimentally from V2AlCV_2AlC MAX-phase powder by selective Al removal and subsequent delamination, and represented in first-principles studies as V2CT2V_2CT_2 to denote surface terminations such as O-O, F-F, and OH-OH. In the currently documented literature, its defining features are a metallic electronic structure, termination-sensitive interlayer geometry, broadband plasmonic extinction extending into the near-infrared, strong saturable absorption at telecommunication wavelengths, and stacking-dependent ion-intercalation behavior relevant to Na- and Al-based electrochemical storage (Wang et al., 25 Aug 2025, Caffrey, 2018, Nair et al., 3 Mar 2026). A notable boundary of the literature is that direct-synthesis and chemical-vapor-deposition studies of MXenes do not, in the cited record, provide a direct-synthesis or CVD route for V2CV_2C specifically (Wang et al., 2022).

1. Crystallographic identity and surface chemistry

Few-layer V2CV_2C MXene is most commonly discussed as V2CT2V_2CT_2, where TT denotes terminating groups created by the chemical etching route. In explicit mixed-termination modeling, the composition V2AlCV_2AlC0 was used with V2AlCV_2AlC1, V2AlCV_2AlC2, and V2AlCV_2AlC3, corresponding to surface coverages of 21%, 59%, and 20%, respectively. There is considerable debate regarding the contribution of these functional groups to the properties of the underlying MXene material, particularly because measured Li or Na capacity is far lower than that predicted by theoretical simulations that generally assume uniformly terminated surfaces; within the reported calculations, weighted averages of uniformly terminated layer properties give excellent approximations to more realistic, randomly terminated structures (Caffrey, 2018).

For uniformly terminated monolayers, a single V2AlCV_2AlC4 layer with V2AlCV_2AlC5 or V2AlCV_2AlC6 termination adopts the hexagonal V2AlCV_2AlC7 symmetry inherited from its parent MAX phase. After full relaxation, monolayer V2AlCV_2AlC8 has an in-plane lattice constant V2AlCV_2AlC9, while V2CT2V_2CT_20 is effectively the same within V2CT2V_2CT_21. In fractional coordinates, V occupies V2CT2V_2CT_22 and V2CT2V_2CT_23, C occupies V2CT2V_2CT_24 and V2CT2V_2CT_25, and the terminal O or F atoms lie at V2CT2V_2CT_26 with V2CT2V_2CT_27 for O and V2CT2V_2CT_28 for F. In few-layer models, the same V2CT2V_2CT_29-parameter is retained while the out-of-plane repeat distance O-O0 depends on stacking; typical central-layer C-C interlayer spacings in pristine ZZ-oct O-O1 converge to O-O2 (Nair et al., 3 Mar 2026).

Across realistic termination mixtures, few-layer O-O3 remains metallic. Total and projected density of states show a clear Fermi-level crossing, with states near O-O4 dominated by V O-O5 hybridized with C O-O6, while termination-O-O7 states lie deeper, below O-O8 eV. This metallicity is central to both its plasmonic optical response and its use in electrochemical hosts (Caffrey, 2018).

2. Exfoliation route and experimental structural characterization

The reported preparation of few-layer O-O9 begins from F-F0 MAX-phase powder with average particle size F-F1m. HF etching at 49 wt% was carried out at F-F2, 500-800 rpm, for 48 h to remove Al layers and yield accordion-like multilayer F-F3. Intercalation then proceeded through successive treatments with 5 wt% TMAOH at room temperature for 12 h and ethanol washes to F-F4, expanding the interlayer spacing. A LiCl solution flocculation step, performed for F-F5, replaced F-F6 with F-F7 and produced a flocculate that could be stored long-term. Final delamination was achieved by washing with deionized water, re-dispersion in N-methyl-2-pyrrolidone (NMP), 30 min ultrasonication, and 15 min centrifugation at 3000 rpm, yielding stable few-layer F-F8 dispersions in NMP (Wang et al., 25 Aug 2025).

Transmission electron microscopy shows transparent, sheet-like flakes with lateral sizes ranging from hundreds of nanometers to a few micrometers, indicative of exfoliation into a few atomic layers. Atomic force microscopy was not shown for this system, but on similar MXenes it typically confirms thicknesses of 2-5 nm, corresponding to 3-7 atomic layers. X-ray diffraction shows disappearance of most MAX-phase peaks; only the F-F9 MXene reflection remains, broadened and shifted from OH-OH0 to OH-OH1, corresponding to an interlayer spacing of OH-OH2 versus OH-OH3 in OH-OH4. Energy-dispersive X-ray spectroscopy gives uniform V, C, F, and O mapping, consistent with successful MXene formation and surface terminations by OH-OH5 and OH-OH6. Raman spectroscopy identifies the in-plane OH-OH7 mode at OH-OH8 and the OH-OH9 mode at V2CV_2C0; additional peaks at 411, 526, and V2CV_2C1 arise from mixed vibrational modes of V2CV_2C2 with V2CV_2C3 and V2CV_2C4 groups. Abundant V2CV_2C5, V2CV_2C6, and V2CV_2C7 terminations impart hydrophilicity and tune the electronic and plasmonic behavior (Wang et al., 25 Aug 2025).

3. Plasmonic response, metallicity, and ultrafast relaxation

Optically, few-layer V2CV_2C8 exhibits broad extinction up to 2000 nm in UV-Vis-NIR spectroscopy, a response described as characteristic of surface plasmon resonance in metallic MXene. Concentration-dependent measurements support broadband plasmonic absorption rather than molecular transitions. Lateral size also modifies the resonance: smaller flakes exhibit broader SPR bands due to increased surface scattering, whereas larger flakes show narrowed plasmon modes, analogous to gold nanoparticle behavior. Although no explicit quality factor was reported, the bandwidth-to-resonance ratio V2CV_2C9 at V2CV_2C0 nm indicates a low-V2CV_2C1, broadband SPR suited to ultrafast applications (Wang et al., 25 Aug 2025).

Pump-probe transient absorption measurements using 325 nm interband excitation and 1300 nm plasmonic excitation show broadband photo-induced absorption below 670 nm, assigned to excited-state absorption, and photobleaching above 670 nm, assigned to ground-state bleaching due to state-filling. In the plasmonic region, time-resolved dynamics at probe wavelength 1100 nm exhibit an ultrafast decay component with V2CV_2C2 fs and amplitude V2CV_2C3, attributed to hot-electron generation via Landau damping followed by electron-electron scattering. At probe wavelength 500 nm, V2CV_2C4 increases to approximately 1 ps and V2CV_2C5 decreases to approximately 0.4, indicating dominance of picosecond electron-phonon scattering. Near the SPR, the V2CV_2C6 fs hot-electron channel accounts for about 90% of the total relaxation (Wang et al., 25 Aug 2025).

First-principles analysis links these dynamics to the electronic structure of terminated monolayers. Both V2CV_2C7 and V2CV_2C8 are metallic, with bands crossing V2CV_2C9. Parity analysis at the T-point and the joint density of states show a JDOS peak near 4 eV, matching the 325 nm pump and supporting strong interband transitions in the UV, while below 4 eV the JDOS drops, implying that NIR excitation cannot drive direct interband transitions near V2CT2V_2CT_20. Instead, NIR photons excite collective plasmon modes. Landau damping on a V2CT2V_2CT_21 fs scale produces nonthermal hot electrons and holes with energies up to the pump photon energy; electron-electron collisions thermalize these carriers within V2CT2V_2CT_22 fs, and subsequent electron-phonon coupling occurs on a V2CT2V_2CT_23-5 ps timescale. The reported scaling of low-energy hot-carrier yield as V2CT2V_2CT_24 provides the stated basis for the giant ultrafast nonlinear response at 1550 nm (Wang et al., 25 Aug 2025).

4. Nonlinear saturable absorption at telecommunication wavelengths

Few-layer V2CT2V_2CT_25 has been characterized as a saturable absorber by open-aperture Z-scan using 35 fs pulses at 1 kHz, tunable from 800 to 1800 nm, focused through an approximately 1 mm path length of V2CT2V_2CT_26 dispersion in a quartz cuvette. At all investigated wavelengths, the transmittance displays a symmetric peak at focus, confirming saturable absorption. The fitting procedure uses the standard open-aperture Z-scan formalism with

V2CT2V_2CT_27

where V2CT2V_2CT_28 is the on-axis peak intensity and

V2CT2V_2CT_29

with TT0 the nonlinear absorption coefficient (Wang et al., 25 Aug 2025).

The extracted TT1 values are wavelength dependent: TT2 at 800 nm, TT3 at 1150 nm, TT4 at 1300 nm, TT5 at 1550 nm, and TT6 at 1800 nm. The strongest saturable absorption therefore occurs at 1550 nm. At that wavelength, TT7 is reported as roughly twice that of TT8 at 1200 nm, where the cited value is TT9 (Wang et al., 25 Aug 2025).

The intensity dependence can be described by the standard two-level saturable-absorber expression

V2AlCV_2AlC00

where V2AlCV_2AlC01 is the non-saturable loss, V2AlCV_2AlC02 is the modulation depth, and V2AlCV_2AlC03 is the saturation intensity. Using the Z-scan V2AlCV_2AlC04 and an assumed V2AlCV_2AlC05, one can estimate V2AlCV_2AlC06, corresponding to a modulation depth V2AlCV_2AlC07-15% and residual loss V2AlCV_2AlC08-90%; the source notes, however, that precise V2AlCV_2AlC09 and V2AlCV_2AlC10 require power-dependent transmission curves (Wang et al., 25 Aug 2025).

5. Integration into erbium-doped fiber lasers

The reported laser implementation uses an all-fiber erbium-doped fiber laser. The pump source is a 976 nm laser diode coupled through a wavelength-division multiplexer, the gain medium is approximately 1.3 m of V2AlCV_2AlC11-doped fiber, and the cavity includes an integrated WDM/pump combiner, a polarization-independent isolator, an output coupler, and polarization controllers. The saturable absorber is a V2AlCV_2AlC12-coated side-polished, or “D-shaped,” fiber segment, which provides evanescent-field interaction without bulk optics. The cavity length is approximately 5 m, giving a fundamental repetition rate of approximately 39.5 MHz (Wang et al., 25 Aug 2025).

Mode locking begins at a pump power of approximately 72 mW and is maintained up to 500 mW, with 12.24 mW average output. Autocorrelation fitted with a V2AlCV_2AlC13 profile gives a deconvolved pulse duration V2AlCV_2AlC14 fs. The optical spectrum has center wavelength V2AlCV_2AlC15 nm and 3 dB bandwidth V2AlCV_2AlC16 nm, with clear Kelly sidebands indicating soliton operation. The measured repetition rate is V2AlCV_2AlC17 MHz, and the RF spectrum shows a signal-to-noise ratio of 92 dB. No significant spectral shift or power degradation is observed over 8 h. From V2AlCV_2AlC18, the pulse energy is approximately V2AlCV_2AlC19 pJ (Wang et al., 25 Aug 2025).

These measurements place few-layer V2AlCV_2AlC20 within the class of plasmonic MXene saturable absorbers operating at the communication band around 1550 nm. In this setting, the material’s low-V2AlCV_2AlC21 broadband SPR and the dominance of the V2AlCV_2AlC22 fs relaxation channel are directly connected to stable femtosecond pulse generation (Wang et al., 25 Aug 2025).

6. Mixed terminations, ion intercalation, and limits of the present synthesis record

For electrochemical modeling, mixed terminations are a primary variable. In the reported Na-intercalation calculations, few-layer V2AlCV_2AlC23 with realistic mixed terminations is metallic under all studied surface chemistries, and the mixed-termination density of states, lattice constants, and work function are well approximated by a weighted average of uniformly terminated systems:

V2AlCV_2AlC24

The sodiation reaction is written as

V2AlCV_2AlC25

For mixed terminations, the computed specific capacities are approximately 17, 48, 86, 155, and 274 mAh gV2AlCV_2AlC26 at V2AlCV_2AlC27, 0.33, 0.56, 1.0, and 2.0, respectively; the corresponding volume changes V2AlCV_2AlC28 are +11%, +13%, +15%, +16%, and +58%, with the double-Na-layer case involving a V2AlCV_2AlC29-axis increase of approximately V2AlCV_2AlC30. The open-circuit voltage is 2.3, 2.5, 2.1, and 1.7 eV at V2AlCV_2AlC31, 0.33, 0.56, and 1.00, respectively. At low Na concentrations, charge transfer is confined to the terminations, with O V2AlCV_2AlC32 F V2AlCV_2AlC33 OH, while V sites are affected only at higher Na concentrations (Caffrey, 2018).

In Al-ion battery modeling, Veluthedath Nair and Caffrey examined four stacking variants—ZZ-oct, ZZ-pris, WS-oct, and WS-pris—and found WS-oct to be the lowest in energy for pristine V2AlCV_2AlC34, with ZZ-oct only V2AlCV_2AlC35 meV/f.u. higher and both prismatic variants approximately 50-66 meV/f.u. higher. For dilute Al intercalation at V2AlCV_2AlC36 Al/f.u., O-terminated V2AlCV_2AlC37 in ZZ-oct shows an interlayer expansion V2AlCV_2AlC38 and average formation energy V2AlCV_2AlC39, whereas ZZ-pris gives V2AlCV_2AlC40 and only slightly negative formation energy. The corresponding Al migration barriers are approximately 1.44 eV for ZZ-oct and 0.50 eV for ZZ-pris, establishing a trade-off between structural stability and ionic mobility. As Al loading increases in ZZ-oct V2AlCV_2AlC41, the open-circuit voltage falls from approximately 1.8 V at V2AlCV_2AlC42 to approximately 0.8 V at V2AlCV_2AlC43, and the maximum specific capacity is approximately 277.6 mAh gV2AlCV_2AlC44. By contrast, V2AlCV_2AlC45 is limited to V2AlCV_2AlC46 Al/f.u., about 0.4 V average voltage, and V2AlCV_2AlC47 mAh gV2AlCV_2AlC48. Bader analysis indicates that each Al atom donates approximately V2AlCV_2AlC49 to the host; in O-terminated V2AlCV_2AlC50 at V2AlCV_2AlC51, about V2AlCV_2AlC52 localize on bonded O sites and about V2AlCV_2AlC53 on the V layers, preserving metallic character (Nair et al., 3 Mar 2026).

A common misconception is that recently reported direct-synthesis or CVD advances for MXenes already include few-layer V2AlCV_2AlC54. The cited record does not support that interpretation. Wang et al., in “Direct synthesis and chemical vapor deposition of 2D carbide and nitride MXenes,” do not report any direct-synthesis or CVD procedures for V2AlCV_2AlC55 MXene; V2AlCV_2AlC56 is mentioned only in passing among the broader family of MXenes, while the reported direct-synthesis and CVD results are limited to Ti- and Zr-based MXenes, specifically V2AlCV_2AlC57, V2AlCV_2AlC58, V2AlCV_2AlC59, and V2AlCV_2AlC60. Consequently, reaction equations, experimental parameters, CVD protocols, layer-thickness data, thermodynamic or kinetic analyses, observed morphologies, and Li-ion performance are not available for V2AlCV_2AlC61 in that publication (Wang et al., 2022).

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