HfO$_2$-based platform for high-index-contrast visible/UV integrated photonics (2412.09421v2)

Abstract: Ultraviolet and visible integrated photonics are enabling for applications in quantum information, sensing, and spectroscopy, among others. Few materials support low-loss photonics into the UV, and the relatively low refractive index of known depositable materials limits the achievable functionality. Here we present a high-index integrated photonics platform based on HfO$2$ and Al$_2$O$_3$ composites deposited via Atomic Layer Deposition (ALD) with low loss in the visible and near-UV. We show that Al$_2$O$_3$ incorporation dramatically decreases bulk loss compared to pure HfO$_2$, consistent with inhibited crystallization due to the admixture of Al$_2$O$_3$. Composites exhibit refractive index $n$ following the average of that of HfO$_2$ and Al$_2$O$_3$, weighted by the HfO$_2$ fractional composition $x$. At $\lambda=375$ nm, composites with $x=0.67$ exhibit $n=2.08$ preserving most of HfO$_2$'s significantly higher index, and $3.8(7) $ dB/cm material loss. We further present fully etched and cladded waveguides, grating couplers, and ring resonators, realizing single-mode waveguide loss of $0.25(2)$ dB/cm inferred from resonators of 2.6 million intrinsic quality factor at $\lambda=729$ nm, $2.6(2)$ dB/cm at $\lambda=405$ nm, and $7.7(6)$ dB/cm at $\lambda=375$ nm. We measure the composite's thermo-optic coefficient (TOC) to be $2.44(3) \times 10^{-5}$ RIU/$^\circ$C near $\lambda=397$ nm. This work establishes (HfO$_2$)$_x$(Al$_2$O$_3$)${1-x}$ composites as a platform amenable to integration for low-loss, high-index photonics spanning the UV to NIR.