Rubidium Focused Ion Beam Induced Platinum Deposition

Abstract: This work presents characterization of focused ion beam induced deposition (FIBID) of platinum using both rubidium and gallium ions. Under similar beam energies, 8.5 keV for Rb$^+$ and 8.0 keV for Ga$^+$, and beam current near 10 pA, the two ion species deposited Pt films at similar rates. Energy-dispersive x-ray spectroscopy shows that the Rb$^+$ FIBID-Pt consists of similar Pt contents with much lower primary ion contents (5% Rb and 27% Ga) than the Ga$^+$ FIBID-Pt. The deposited material was also measured to have a resistivity of $8.1\times 10^4$ $\mathrm{\mu\Omega\cdot cm}$ for the Rb$^+$ FIBID-Pt and $5.7\times 10^3$ $\mathrm{\mu\Omega\cdot cm}$ for the Ga$^+$ FIBID-Pt.