Fabrication of high quality sub-micron Au gratings over large areas with pulsed laser interference lithography for SPR sensors (1302.2660v1)

Published 11 Feb 2013 in physics.optics

Abstract: Metallic gratings were fabricated using high energy laser interference lithography with a frequency tripled Nd:YAG nanosecond laser. The grating structures were first recorded in a photosensitive layer and afterwards transferred to an Au film. High quality Au gratings with a period of 770 nm and peak-to-valley heights of 20-60 nm exhibiting plasmonic resonance response were successfully designed, fabricated and characterized.

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