Strain-accommodation mechanism during beta-Ga2O3 heteroepitaxy
Determine the mechanism by which strain is accommodated during the transition from an alpha-Ga2O3 wetting layer to beta-Ga2O3 islands on c-plane sapphire, particularly when beta-Ga2O3 islands coalesce into a largely relaxed film without forming misfit dislocations.
References
These observations place \ce{Ga2O3} heteroepitaxy outside the conventional framework of lattice-mismatched systems, where strain is accommodated within a single phase through well-established growth modes such as Frank-van der Merwe, Volmer-Weber, or Stranski--Krastanov. In \ce{Ga2O3}/sapphire, by contrast, the transition from $\alpha$ wetting layer to $\beta$ islands couples morphological change with polymorphic transformation, making the mechanism of strain accommodation during growth an intriguing open question.