Establish feasibility for arbitrary mask periods

Establish whether the two-mirror faceted projection system is feasible for arbitrary spatial periods L_x or L_y, including the required facet positions, facet tilts, coatings, channel counts, mechanical clearance, optical acceptance, phase tolerances, and source-bandwidth constraints.

Background

The proposed projection architecture maps mask diffraction orders to wafer diffraction orders using dedicated planar mirror facets. Changing the mask periods L_x or L_y changes the diffraction angles and therefore can require redesign of the facet geometry, coatings, and number of accepted channels. The paper provides designs for particular periods but does not establish whether the approach remains feasible for arbitrary periods under its mechanical, optical, coherence, and tolerance constraints.

References

It is not established for arbitrary periods.

A Two-Mirror Faceted Projection System for EUV Lithography  (2609.11299 - Es'kin et al., 10 Sep 2026) in Section 6, Discussion: Advantages and Disadvantages of the Proposed Projection System, Disadvantages, item 1