Dominant enhancement mechanisms in WO3−x/CsyWO3−x nanocrystal-modified InGaAs MSM photodetectors
Determine which mechanisms—localized surface plasmon resonance (LSPR) field enhancement in the In0.53Ga0.47As layer, plasmon-induced hot-carrier injection from WO3−x or CsyWO3−x nanocrystals into the semiconductor, or antireflective scattering and photon collection due to nanocrystal films—are present and which are dominant in In0.52Al0.48As/In0.53Ga0.47As metal–semiconductor–metal photodetectors functionalized with WO3−x nanorods or CsyWO3−x hexagonal nanoprisms under the experimental conditions reported.
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Mechanisms for plasmonic response giving rise to increased photodetector EQEs have been debated in recent years. Possible mechanisms to explain our observations include: 1) LSPR modes of the NCs create stronger electric fields in the InGaAs layer of the MSM photodetector, generating charge carriers at a higher rate. 2) Plasmon-induced hot carriers are injected from the NCs into the bulk semiconductor. 3) Photon collection from scattering is increased due to the NC films forming an anti-reflective (AR) coating. It is not clear from the present data which of these mechanisms are present or dominant in our devices.