Dynamical model for the formation of patterned deposits at receding contact lines (1008.4334v1)

Abstract: We describe the formation of deposition patterns that are observed in many different experiments where a three-phase contact line of a volatile nanoparticle suspension or polymer solution recedes. A dynamical model based on a long-wave approximation predicts the deposition of irregular and regular line patterns due to self-organised pinning-depinning cycles corresponding to a stick-slip motion of the contact line. We analyze how the line pattern properties depend on the evaporation rate and solute concentration.