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2D Materials for Future Heterogeneous Electronics (2110.08007v2)

Published 15 Oct 2021 in physics.app-ph

Abstract: Graphene and two-dimensional materials (2DM) remain an active field of research in science and engineering over 15 years after the first reports of 2DM. The vast amount of available data and the high performance of device demonstrators leave little doubt about the potential of 2DM for applications in electronics, photonics and sensing. So where are the integrated chips and enabled products? We try to answer this by summarizing the main challenges and opportunities that have thus far prevented 2DM applications.

Citations (269)

Summary

  • The paper demonstrates that refining wafer-scale deposition and atomic layer etching processes is essential for integrating 2D materials with Si CMOS technology.
  • It reveals significant improvements in carrier mobility and charge scattering reduction through advanced nanosheet architectures for enhanced device performance.
  • The study underscores the potential of 2D materials to drive innovations in photonics, neuromorphic computing, and quantum applications.

Overview of "2D Materials for Future Heterogeneous Electronics"

The paper "2D Materials for Future Heterogeneous Electronics" serves as an integrative assessment and a forward-looking discourse on the potential of two-dimensional (2D) materials like graphene in advancing electronics, photonics, and sensing technologies. The authors systematically identify and analyze the primary challenges precluding these materials from being integrated into mainstream semiconductor manufacturing processes.

Manufacturing Challenges and Technological Readiness

The paper critically examines the technological readiness of 2D materials in the context of existing semiconductor manufacturing environments. It underscores the necessity for "turnkey manufacturing solutions" that enable seamless integration of these materials with silicon (Si) complementary metal-oxide-semiconductor (CMOS) technology. Although wafer-scale deposition and growth technologies exist, issues with defects, contamination, and the lack of mature production-ready etching techniques pose significant barriers. The development of meticulous atomic layer etching processes and the establishment of low-resistance ohmic contacts to 2D materials are imperative for meeting industry specifications.

Applications and Advancements in Electronics

Significant advances in various domains indicate the potential for substantial improvements in semiconductor device performance. The authors delineate a transition from FinFETs to more advanced stacked nanosheet architectures, emphasizing that 2D materials may alleviate the issues related to charge scattering at minimized channel thicknesses. The intrinsic properties of 2D semiconductors offer superior carrier mobility and short-channel effect suppression, thus presenting a compelling case for their use as channel materials in the latest technology nodes.

Photonics and Optoelectronics

The paper posits that 2D materials hold considerable promise in photonics, especially in regimes not effectively covered by Si-based materials. Photonic integrated circuits could leverage 2D materials' wide-band characteristics for high-efficiency data transmission. Moreover, the elimination of stringent epitaxial requirements associated with 2D-based photonics fosters integration with both Si photonics and non-silicon amorphous waveguide materials.

Potential in Neuromorphic and Quantum Computing

The paper outlines the role of 2D materials in neuromorphic computing by simulating synaptic functions through memristive characteristics, advocating for low-energy, high-efficiency hardware for AI applications. Furthermore, in quantum technologies, 2D materials enable novel quantum states with potential applications in spintronics, superconductivity, and artificial quantum systems. The authors suggest that advances in creating spin qubits in graphene, with its advantageous spin and valley properties, could enhance quantum computing paradigms.

Theoretical and Practical Implications

The integration of 2D materials into Si technology could herald a new era of heterogeneous scaling, characterized by unprecedented multifunctionality in 3D chip stacks. Additionally, their role in “CMOS + X” paradigms signifies their potential to act as an X-factor, enhancing the range of functionalities possible within integrated systems.

Conclusion and Future Directions

In conclusion, the authors advocate for intensified efforts to overcome the manufacturing challenges currently inhibiting the adoption of 2D materials. Attaining the sought-after manufacturing readiness levels will enable more effective co-integration with Si CMOS technology, ultimately expanding the frontier of heterogeneous electronics. The significant varietal advantages and potential applications portrayed throughout the paper underscore the vital role 2D materials are set to play in the evolution and expansion of semiconductor technology. Future efforts are likely to focus on refining fabrication processes, exploring mixed-material heterostructures, and realizing large-scale integration for specialized applications. As these hurdles are surmounted, the benefits of 2D materials in enabling advanced functionalities and energy-efficient computing systems are poised to become increasingly apparent.

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