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1305 nm MoTe2-on-silicon Laser

Published 4 Oct 2017 in cond-mat.mes-hall, physics.app-ph, and physics.optics | (1710.01591v1)

Abstract: The missing piece in the jigsaw of silicon photonics is a light source that can be easily incorporated into the standard silicon fabrication process. Recent advances in the development of atomically thin layers of semiconducting transition metal dichalogenides (TMDs), with direct bandgaps in the near-infrared region, have opened up new possibilities for addressing this need. Here, we report a unique silicon laser source that employs molybdenum ditelluride (MoTe2) as a gain material in a photonic crystal nanocavity resonator, fabricated in silicon-on-insulator. We demonstrate optically pumped MoTe2-on-silicon devices lasing at 1305 nm, i.e. in the centre of the O-band used in optical communications, operating in the continuous-wave (CW) regime, at room temperature and with a threshold power density as low as 1.5 kW/cm2. This 2D-on-silicon geometry offers the promise of an integrated low-cost electrically pumped nanoscale silicon light source, thereby adding an essential building block to the silicon photonics platform.

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