Heterogeneously integrated lithium tantalate-on-silicon nitride modulators for high-speed communications (2508.06265v1)

Abstract: Driven by the prospects of higher bandwidths for optical interconnects, integrated modulators involving materials beyond those available in silicon manufacturing increasingly rely on the Pockels effect. For instance, wafer-scale bonding of lithium niobate films onto ultralow loss silicon nitride photonic integrated circuits provides heterogeneous integrated devices with low modulation voltages operating at higher speeds than silicon photonics. However, in spite of its excellent electro-optic modulation capabilities, lithium niobate suffers from drawbacks such as birefringence and long-term bias instability. Among other available electro-optic materials, lithium tantalate can overcome these shortcomings with its comparable electro-optic coefficient, significantly improved photostability, low birefringence, higher optical damage threshold, and enhanced DC bias stability. Here, we demonstrate wafer-scale heterogeneous integration of lithium tantalate films on low-loss silicon nitride photonic integrated circuits. With this hybrid platform, we implement modulators that combine the ultralow optical loss ($\sim$ 14.2 dB/m), mature processing and wide transparency of silicon nitride waveguides with the ultrafast electro-optic response of thin-film lithium tantalate. The resulting devices achieve a 6 V half-wave voltage, and support modulation bandwidths of up to 100 GHz. We use single intensity modulators and in-phase/quadrature (IQ) modulators to transmit PAM4 and 16-QAM signals reaching up to 333 and 581 Gbit/second net data rates, respectively. Our results demonstrate that lithium tantalate is a viable approach to broadband photonics sustaining extended optical propagation, which can uniquely contribute to technologies such as RF photonics, interconnects, and analog signal processors.